Improved photoelectrochemical performance of Ti-doped α-Fe2O3 thin films by surface modification with fluoride†
Abstract
* Corresponding authors
a
Department of Chemical Engineering, University of California at Santa Barbara, Santa Barbara, CA, USA
E-mail:
mcfar@engineering.ucsb.edu
Fax: +1 (0)408 228 8728
Tel: +1 (0)805 893 4343
b Materials Department, University of California at Santa Barbara, Santa Barbara, CA, USA
c Department of Chemistry & Biochemistry, University of California at Santa Barbara, Santa Barbara, CA, USA
Y. Hu, A. Kleiman-Shwarsctein, G. D. Stucky and E. W. McFarland, Chem. Commun., 2009, 2652 DOI: 10.1039/B901135H
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