Issue 19, 2004

Aerosol assisted chemical vapour deposition of photochromic tungsten oxide and doped tungsten oxide thin films

Abstract

Thin films of tungsten oxide, titanium doped tungsten oxide and overlayers of titanium oxide/tungsten oxide have been produced by aerosol assisted CVD (AACVD) at 400 °C. The films were crystalline monoclinic WO3 by XRD, showing strong preferred orientation in the (0 2 0) plane. Films were blue on deposition (WO3−x; x ≈ 0.1). Fully oxidised yellow WO3 films were produced by annealing the blue films in air at 500 °C. The annealed films showed a photochromic transition to a coloured blue state when irradiated with 254 nm or 365 nm UV light. The colour change was reversible; the films returned to their original yellow colour when left in the dark, after which the blue colour could be regained by further UV irradiation. The WO3 and layered WO3/TiO2 films showed significant photochromism, while comparable thickness titanium doped WO3 films showed reduced photochromism, proportional to the level of Ti doping.

Graphical abstract: Aerosol assisted chemical vapour deposition of photochromic tungsten oxide and doped tungsten oxide thin films

Article information

Article type
Paper
Submitted
27 Apr 2004
Accepted
18 Jun 2004
First published
18 Aug 2004

J. Mater. Chem., 2004,14, 2864-2867

Aerosol assisted chemical vapour deposition of photochromic tungsten oxide and doped tungsten oxide thin films

R. G. Palgrave and I. P. Parkin, J. Mater. Chem., 2004, 14, 2864 DOI: 10.1039/B406337F

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