Issue 5, 2002
From the journal:

Journal of Materials Chemistry

Josef Pola,*a   Magna Santos,b   Luis Díaz,b   Kristýna Jursíková,a   Zdeněk Bastl,c   Jaroslav Boháček,d   Radek Fajgara  and  Markéta Urbanováa  

* Corresponding authors

a Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, Prague, Czech Republic

b Instituto de Estructura de la Materia, C. S.I. C., Serrano 121, Madrid, Spain

c J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Prague, Czech Republic

d Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, Řež near Prague, Czech Republic

Abstract

Multi-pulse and single-pulse infrared laser induced thermolysis of gaseous (chloromethyl)silane, H3SiCH2Cl occurs via 1,1-HCl and H2C: elimination and dehydrogenation and yields nano-structured Si/C/H phases containing most of the Si and C atoms of the precursor. The identification of final volatile products and observation of H2Si:, H2C: and HClSi: transients by LIF spectroscopy suggest that intermediate silene isomers decompose into silylene and carbene. The deposited films are composed of SiC and polycarbosilane and their H content differs depending on the mode of the IR thermolysis.

Graphical abstract: IR laser-induced thermolysis of (chloromethyl)silane: complex reaction involving H2Si:, H2C: and HClSi: transients and yielding nanostructured Si/C/H phases

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Article information

DOI
https://doi.org/10.1039/B200061J
Article type
Paper
Submitted
03 Jan 2002
Accepted
19 Feb 2002
First published
22 Mar 2002

J. Mater. Chem., 2002,12, 1519-1524

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IR laser-induced thermolysis of (chloromethyl)silane: complex reaction involving H2Si:, H2C: and HClSi: transients and yielding nanostructured Si/C/H phases

J. Pola, M. Santos, L. Díaz, K. Jursíková, Z. Bastl, J. Boháček, R. Fajgar and M. Urbanová, J. Mater. Chem., 2002, 12, 1519 DOI: 10.1039/B200061J

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