Hydrogen peroxide is an effective chemical polish for gallium arsenide in the pH range 6–8.5. The polished gallium arsenide surface has a surface roughness of < 1 nm and is superior to that obtained from polishing with dibromine–methanol solutions.
S. G. McMeekin, M. Robertson, L. McGhee and J. M. Winfield, J. Mater. Chem., 1992, 2, 367 DOI: 10.1039/JM9920200367
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