Issue 6, 2021

Bulk boron doping and surface carbon coating enabling fast-charging and stable Si anodes: from thin film to thick Si electrodes

Abstract

To address the issues of the particle fracture and loss of electrical connectivity of high capacity silicon anodes, herein, we propose a novel strategy that combines surface carbon coating and bulk boron doping. Heavily boron doped polycrystalline photovoltaic Si particles are used as starting materials. The bulk boron doping is demonstrated to enhance both electron transportation and lithium-ion diffusion, which contributes to superior high-rate performance. Taking advantage of the fast kinetics and stable interphase with the electrolyte, the carbon coated boron doped Si electrode exhibits higher capacity retention. For example, the capacity retentions are 668 mA h g−1, 293 mA h g−1 and 79 mA h g−1 at a high rate of 0.5C (1C = 4000 mA g−1) after 500 cycles for 3900 ppm, 120 ppm, and 10 ppm boron doped Si, respectively. In addition, an improved mass loading of 2.0 mg cm−2, high areal capacity (3.9 mA h cm−2) and high-volume capacity (2111 mA h cm−3) are achieved. Our work opens a new horizon for designing stable high loading Si anodes, which is applicable for other alloy electrode materials.

Graphical abstract: Bulk boron doping and surface carbon coating enabling fast-charging and stable Si anodes: from thin film to thick Si electrodes

Supplementary files

Article information

Article type
Paper
Submitted
21 Oct 2020
Accepted
18 Dec 2020
First published
29 Dec 2020

J. Mater. Chem. A, 2021,9, 3628-3636

Bulk boron doping and surface carbon coating enabling fast-charging and stable Si anodes: from thin film to thick Si electrodes

X. Han, Z. Zhang, H. Chen, L. Luo, Q. Zhang, J. Chen, S. Chen and Y. Yang, J. Mater. Chem. A, 2021, 9, 3628 DOI: 10.1039/D0TA10282B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements