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Mechanical strain engineering of dielectric tunability in polycrystalline SrTiO3 thin films

Abstract

Optimizing performance using low cost scalable processing and substrates is critical if functional oxide thin films are to achieve commercialisation. Here, we present a comprehensive investigation of the role low cost Al2O3, SrTiO3, MgO substrates on the structure, microstructure and electrical properties of SrTiO3 (ST) thin films, deposited by sol gel processing. We demonstrate that the dielectric properties, of polycrystalline SrTiO3 (ST) films depend on the strain/stress induced by the substrates. ST films deposited on Al2O3/Pt substrates under a high tensile stress possess the smallest grain size and present the lowest value of the relative permittivity, εr, with the lowest dielectric tunability. In contrast, ST films deposited on MgO/Pt substrates, under the highest compressive stress, have the highest value of εr, tunability and polarization. It is thus demonstrated that for polycrystalline ST films the relative permittivity and dielectric tunability may be optimised through an induced compressive stress state.

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Publication details

The article was received on 25 Jan 2018, accepted on 10 Feb 2018 and first published on 12 Feb 2018


Article type: Paper
DOI: 10.1039/C8TC00414E
Citation: J. Mater. Chem. C, 2018, Accepted Manuscript
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    Mechanical strain engineering of dielectric tunability in polycrystalline SrTiO3 thin films

    A. Tkach, O. Okhay, I. M. Reaney and P. M. Vilarinho, J. Mater. Chem. C, 2018, Accepted Manuscript , DOI: 10.1039/C8TC00414E

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