Jump to main content
Jump to site search


Preparation of a porous NiO array-patterned film and its enhanced electrochromic performance

Abstract

In this paper, a novel photochemical etching technology, photosensitive sol-gel method was employed to prepare porous NiO electrochromic patterned film. The sol was first prepared using nickel(II) acetate as the raw material, anhydrous methanol as the solvent and acetylacetone as the photosensitizer. Then, the chemically-modified NiO gel film was prepared onto the glass substrate coated with ITO film. The obtained NiO gel film has a stronger photosensitivity to ultraviolet light with a wavelength of 305 nm. Therefore, after UV exposure, rinsing with the solvent and heat treatment, the NiO gel film covered with a porous array mask can be converted into a porous NiO array-patterned film. Compared to the compact NiO film, the porous NiO patterned film has a wider optical modulation range (51%), higher coloration efficiency (40 cm2/C), longer service life (the peak current density reduction <10% after 3000 cycles) and higher switching speed (coloring time 7 s, bleaching time 5 s).

Back to tab navigation

Publication details

The article was received on 23 Jan 2018, accepted on 10 Apr 2018 and first published on 12 Apr 2018


Article type: Paper
DOI: 10.1039/C8TC00367J
Citation: J. Mater. Chem. C, 2018, Accepted Manuscript
  •   Request permissions

    Preparation of a porous NiO array-patterned film and its enhanced electrochromic performance

    Y. Ren, X. Zhou, H. Zhang, L. Lei and G. Zhao, J. Mater. Chem. C, 2018, Accepted Manuscript , DOI: 10.1039/C8TC00367J

Search articles by author

Spotlight

Advertisements