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pH-Dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

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Abstract

Facet-engineering and the deposition of co-catalysts lead to significant improvement in efficiency of semiconductors in photocatalytic applications. Here, we demonstrate, using the specific example of bismuth-oxy-bromide (BiOBr) particles, that facet-selective, photo-induced reductive or oxidative deposition of co-catalysts onto plate-like semiconductor particles is strongly pH-dependent. High resolution atomic force microscopy and spectroscopy measurements demonstrate that the effect of pH is caused by a reversal of the surface charge of the [001] facets upon increasing pH from 3 to 9 (isoelectric point ≈5), while the side facets become increasingly negatively-charged. We discuss the effect of facet-surface-charge on particle distributions by band-bending, favoring either electron transfer and metal deposition, or hole transfer and metal-oxide deposition. This finding opens up new ways to design highly effective, photocatalytic composite architectures, containing spatially separated catalytic particles of multiple compositions.

Graphical abstract: pH-Dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

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Publication details

The article was received on 24 Jan 2018, accepted on 22 Mar 2018 and first published on 26 Mar 2018


Article type: Paper
DOI: 10.1039/C8TA00781K
Citation: J. Mater. Chem. A, 2018, Advance Article
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    pH-Dependence in facet-selective photo-deposition of metals and metal oxides on semiconductor particles

    Y. Guo, I. Siretanu, Y. Zhang, B. Mei, X. Li, F. Mugele, H. Huang and G. Mul, J. Mater. Chem. A, 2018, Advance Article , DOI: 10.1039/C8TA00781K

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