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Issue 10, 2018
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Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution

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Abstract

We report a new atomic layer deposition (ALD) process for nickel carbide (Ni3C). The process uses bis(1,4-di-tert-butyl-1,3-diazabutadienyl)nickel(II) and H2 plasma and is able to produce smooth, pure, crystalline Ni3C thin films in an ideal self-limiting ALD growth fashion. Using this ALD process, a uniform thin layer of Ni3C can be conformally coated on carbon nanotubes (CNTs) to afford a core–shell nanostructured Ni3C/CNT composite. The ALD-prepared Ni3C/CNT composite is demonstrated to show excellent performance for supercapacitors and electrocatalytic hydrogen evolution.

Graphical abstract: Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution

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Publication details

The article was received on 20 Nov 2017, accepted on 17 Dec 2017 and first published on 18 Dec 2017


Article type: Paper
DOI: 10.1039/C7TA10202J
Citation: J. Mater. Chem. A, 2018,6, 4297-4304
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    Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution

    W. Xiong, Q. Guo, Z. Guo, H. Li, R. Zhao, Q. Chen, Z. Liu and X. Wang, J. Mater. Chem. A, 2018, 6, 4297
    DOI: 10.1039/C7TA10202J

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