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Issue 7, 2018
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Efficient photocatalytic fixation of N2 by KOH-treated g-C3N4

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Abstract

Development of N2 photofixation under mild conditions is challenging; one reason for low efficiency is the poor reactivity between water and photocatalysts. Herein, C3N4 after KOH etching was used as an efficient photocatalyst, and CH3OH was first introduced as a proton source. The photocatalyst presented a high ammonia evolution rate of 3.632 mmol g−1 h−1 and achieved an apparent quantum yield of 21.5% at ∼420 nm. In addition to the role of reacting with holes to accelerate the production and transfer of electrons, CH3OH also promoted the solubility of N2 and provided a proton to the activated N2. The CH3OH system should be instructive for a better understanding of proton-enhanced photocatalysis.

Graphical abstract: Efficient photocatalytic fixation of N2 by KOH-treated g-C3N4

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Publication details

The article was received on 06 Nov 2017, accepted on 09 Jan 2018 and first published on 09 Jan 2018


Article type: Paper
DOI: 10.1039/C7TA09762J
Citation: J. Mater. Chem. A, 2018,6, 3005-3011
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    Efficient photocatalytic fixation of N2 by KOH-treated g-C3N4

    X. Li, X. Sun, L. Zhang, S. Sun and W. Wang, J. Mater. Chem. A, 2018, 6, 3005
    DOI: 10.1039/C7TA09762J

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