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In-Plane Stress Development in Mesoporous Thin Films


Ordered mesoporous thin films of TiO2 and CexZr1-xO2 (x = 0, 0.5, 1) were prepared via an evaporation-induced self-assembly process (EISA) and subsequently investigated in terms of the developing intrinsic and residual in-plane stress. These mechanical properties were determined by the curvature method, which is based on the determination of the deflection of light due to concave or convex bending of the films on a substrate. The films were investigated in regards to the intrinsic stress during the heat treatment up to 500 °C and to the residual stress at room temperature for several annealing temperatures. Following this strategy, the influence of the decomposition of the block copolymer template on the intrinsic stress as well as the pore collapsing on the residual stress was analyzed. Nanoporous TiO2 thin films were prepared using two different block copolymers (PIB50-b-PEO45 and Pluronic® F127). A comparison between templated and non-templated TiO2 films showed the lowest intrinsic and residual stress for the highly ordered mesoporous material prepared with PIB50-b-PEO45 indicating the distributed polymer and the corresponding mesopores act as relaxing agents for the system, which was verified by mesoporous CexZr1-xO2 (x = 0, 0.5, 1) thin films showing a comparable behavior in terms of the experienced intrinsic stress. This work reveals the increase in the residual in-plane stress during the pore collapse, which lays the foundation for further understanding the stress-related mechanical properties of mesoporous thin films.

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Publication details

The article was received on 30 Jan 2018, accepted on 02 Mar 2018 and first published on 05 Mar 2018

Article type: Paper
DOI: 10.1039/C8NR00793D
Citation: Nanoscale, 2018, Accepted Manuscript
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    In-Plane Stress Development in Mesoporous Thin Films

    P. Cop, S. Kitano, K. Niinuma, B. Smarsly and H. Kozuka, Nanoscale, 2018, Accepted Manuscript , DOI: 10.1039/C8NR00793D

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