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Nanocracking and Metallization Doubly-defined Large-scale 3D Plasmonic Sub-10nm-gap arrays as Extremely Sensitive SERS Substrate

Abstract

Faced with the technological difficulties in existing approaches to form nanoscale gaps, a convenient method to fabricate three-dimensional (3D) sub-10 nm Ag/SiNx gap arrays was demonstrated, controlled by a combination of stress-induced nanocracking of SiNx nanobridge and Ag nanofilm deposition. This scalable 3D plasmonic nanogap is specially suspended above a substrate, having tunable nanogap width and large height-to-width ratio to form a nanocavity underneath. As a surface-enhanced Raman scattering (SERS) substrate, such a 3D Ag/SiNx nanogap shows a large Raman enhancement factor of ~108 and extremely high sensitivity for detecting Rhodamine 6G (R6G) molecules even down to 10-16 M, indicating an extraordinary capability for single-molecule detection. Further, we verify that Fabry-Perot resonance occurs in the deep SiNx nanocavity under the Ag nanogap, contributing prominently to a tremendous enhancement of local field at the Ag-nanogap zone and hence ultrasensitive SERS detection. This method circumvents the technological limitations to fabricate sub-10 nm metal nanogap with unique features for a wide application in important scientific and technological areas.

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Publication details

The article was received on 20 Nov 2017, accepted on 31 Dec 2017 and first published on 02 Jan 2018


Article type: Paper
DOI: 10.1039/C7NR08646F
Citation: Nanoscale, 2018, Accepted Manuscript
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    Nanocracking and Metallization Doubly-defined Large-scale 3D Plasmonic Sub-10nm-gap arrays as Extremely Sensitive SERS Substrate

    J. Li, R. Pan, Y. Yang, Y. Wang, S. Li, Z. liu, Y. Su, B. Quan, Y. Li and C. Gu, Nanoscale, 2018, Accepted Manuscript , DOI: 10.1039/C7NR08646F

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