Jump to main content
Jump to site search

Issue 14, 2018
Previous Article Next Article

A simple anti-solvent method for the controlled deposition of metal and alloy nanoparticles

Author affiliations

Abstract

Plasmonics of metal and alloy nanoparticles finds immense applications in materials science, medicine and advanced physics. Controlled deposition of these nanoparticles onto simple substrates to yield high Plasmon intensity for different applications such as single molecule sensing is still a challenge. Herein, we present a very simple and general strategy for their controlled deposition, plausibly mediated by the anti-solvent effect or preferential solvation.

Graphical abstract: A simple anti-solvent method for the controlled deposition of metal and alloy nanoparticles

Back to tab navigation

Publication details

The article was received on 15 Mar 2018, accepted on 09 Jun 2018 and first published on 11 Jun 2018


Article type: Paper
DOI: 10.1039/C8NJ01285G
Citation: New J. Chem., 2018,42, 11979-11983
  •   Request permissions

    A simple anti-solvent method for the controlled deposition of metal and alloy nanoparticles

    A. Ajayan, V. Madhavan, S. Chandran and P. Raveendran, New J. Chem., 2018, 42, 11979
    DOI: 10.1039/C8NJ01285G

Search articles by author

Spotlight

Advertisements