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A Simple Anti-solvent Method for the Controlled Deposition of Metal and Alloy Nanoparticles

Abstract

Plasmonics of metal and alloy nanoparticles find immense applications in materials science, medicine and advanced physics. Controlled deposition of these nanoparticles onto simple substrates to yield high Plasmon intensity for different applications such as single molecule sensing is still a challenge. Herein, we present a very simple and general strategy for their controlled deposition, plausibly mediated by anti-solvent effect or preferential solvation.

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Publication details

The article was received on 15 Mar 2018, accepted on 09 Jun 2018 and first published on 11 Jun 2018


Article type: Paper
DOI: 10.1039/C8NJ01285G
Citation: New J. Chem., 2018, Accepted Manuscript
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    A Simple Anti-solvent Method for the Controlled Deposition of Metal and Alloy Nanoparticles

    R. Poovathinthodiyil, A. Ajayan, V. Madhavan and S. Chandran, New J. Chem., 2018, Accepted Manuscript , DOI: 10.1039/C8NJ01285G

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