Jump to main content
Jump to site search

Issue 8, 2018
Previous Article Next Article

Exploring the optical properties of Vernier phase yttrium oxyfluoride thin films grown by pulsed liquid injection MOCVD

Author affiliations

Abstract

In this work, we report on the first successful deposition of Vernier phase yttrium oxyfluoride (V-YOF) thin films on Si (100) wafers using pulsed liquid injection metal organic chemical vapor deposition (PLI-MOCVD). The formation of V-YOF has been confirmed by X-ray diffraction measurements and electron probe microanalysis. The infrared phonon modes of V-YOF thin films and their corresponding optical constants as inferred from spectroscopic ellipsometry are reported here for the first time. The V-YOF thin films are featured by a broad absorption band centering around 370–373 cm−1; their refractive index is located between those of YF3 and Y2O3, and which shows an intimate relationship with the oxygen content in the film. The luminescence properties of Er3+ doped V-YOF thin films are finally examined and compared with that of YF3. Our results highlight that the as-deposited V-YOF thin films by PLI-MOCVD serve as promising candidates as efficient host material for spectral conversion for photovoltaic applications.

Graphical abstract: Exploring the optical properties of Vernier phase yttrium oxyfluoride thin films grown by pulsed liquid injection MOCVD

Back to tab navigation

Publication details

The article was received on 19 Nov 2017, accepted on 22 Jan 2018 and first published on 22 Jan 2018


Article type: Paper
DOI: 10.1039/C7DT04359G
Citation: Dalton Trans., 2018,47, 2655-2661
  •   Request permissions

    Exploring the optical properties of Vernier phase yttrium oxyfluoride thin films grown by pulsed liquid injection MOCVD

    S. Zhang, M. Modreanu, H. Roussel, C. Jiménez and J. Deschanvres, Dalton Trans., 2018, 47, 2655
    DOI: 10.1039/C7DT04359G

Search articles by author

Spotlight

Advertisements