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Crystallization of silica promoted by residual hydrogen bonding interactions under high temperature

Abstract

A novel approach to prepare crystalline silica through calcining silica-sol / highly fluorinated graphene composite at a relatively low temperature is demonstrated. Silica-sol and its composites with derivatives of graphene (graphene, graphene oxide and graphene with various degree of fluorination) were synthesized and calcined at 900 °C. The consequences of X-ray-diffraction and Fourier transform infrared (FTIR) reveal that cristobalite silica was produced through calcining silica/ highly fluorinated graphene composites under ambient air at relatively low temperature (900 °C). While for the silica-sol/graphene composite, silica-sol/graphene oxide composite and silica-sol/medium or lower fluorinated graphene composite, their calcined products are all amorphous. Thermal gravimetry analysis results indicate that the maximum decomposition temperature of functional groups in highly fluorinated graphene at air temperature is 457 °C, which is higher than that in medium fluorinated graphene, lower fluorinated graphene and graphene oxide (411.3 °C, 313.4 °C and 238.9 °C). High degradation temperature of highly fluorinated graphene contributes to high residual hydrogen interactions of composites under high temperature. FTIR results further illustrate that much residual hydrogen interactions in silica-sol/highly fluorinated graphene composite under higher temperature result in more linear structures. As a consequence, stronger residual hydrogen interactions under high temperature in silica-sol/highly fluorinated graphene composite restrain the self-condensation of Si-OH groups and promote the formation of crystalline structures.

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Publication details

The article was received on 29 Jan 2018, accepted on 09 Apr 2018 and first published on 09 Apr 2018


Article type: Paper
DOI: 10.1039/C8CP00642C
Citation: Phys. Chem. Chem. Phys., 2018, Accepted Manuscript
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    Crystallization of silica promoted by residual hydrogen bonding interactions under high temperature

    X. Zhang, Y. Liu, W. Lai, Z. Wang, X. Liu and X. Wang, Phys. Chem. Chem. Phys., 2018, Accepted Manuscript , DOI: 10.1039/C8CP00642C

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