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Issue 17, 2018
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Evaporation of nanoscale water on a uniformly complete wetting surface at different temperatures

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Abstract

The evaporation of nanoscale water films on surfaces affects many processes in nature and industry. Using molecular dynamics (MD) simulations, we show the evaporation of a nanoscale water film on a uniformly complete wetting surface at different temperatures. With the increase in temperature, the growth of the water evaporation rate becomes slow. Analyses show that the hydrogen bond (H-bond) lifetimes and orientational autocorrelation times of the outermost water film decrease slowly with the increase in temperature. Compared to a thicker water film, the H-bond lifetimes and orientational autocorrelation times of a monolayer water film are much slower. This suggests that the lower evaporation rate of the monolayer water film on a uniformly complete wetting surface may be caused by the constriction of the water rotation due to the substrate. This finding may be helpful for controlling nanoscale water evaporation within a certain range of temperatures.

Graphical abstract: Evaporation of nanoscale water on a uniformly complete wetting surface at different temperatures

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Publication details

The article was received on 03 Jan 2018, accepted on 06 Apr 2018 and first published on 06 Apr 2018


Article type: Paper
DOI: 10.1039/C8CP00037A
Citation: Phys. Chem. Chem. Phys., 2018,20, 12272-12277
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    Evaporation of nanoscale water on a uniformly complete wetting surface at different temperatures

    Y. Guo and R. Wan, Phys. Chem. Chem. Phys., 2018, 20, 12272
    DOI: 10.1039/C8CP00037A

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