Jump to main content
Jump to site search

Issue 17, 2018
Previous Article Next Article

Nanoscale thermal diffusion during the laser interference ablation using femto-, pico-, and nanosecond pulses in silicon

Author affiliations

Abstract

Laser interference ablation in silicon using femto-, pico-, and nanosecond pulses was investigated. The experimental and computational results provide information about nanoscale thermal diffusion during the ultra-short laser–matter interaction. The temperature modulation depth was introduced as a parameter for quality assessment of laser interference ablation. Based on the experiments and calculations, a new semi-empirical formula which combines the interference period with the laser pulse duration, the thermal modulation depth and the thermal diffusivity of the material was derived. This equation is in excellent agreement with the experimental and modelling results of laser interference ablation. This new formula can be used for selecting the appropriate pulse duration for periodical structuring with the required resolution and quality.

Graphical abstract: Nanoscale thermal diffusion during the laser interference ablation using femto-, pico-, and nanosecond pulses in silicon

Back to tab navigation

Publication details

The article was received on 18 Dec 2017, accepted on 13 Apr 2018 and first published on 13 Apr 2018


Article type: Paper
DOI: 10.1039/C7CP08458G
Citation: Phys. Chem. Chem. Phys., 2018,20, 12166-12174
  •   Request permissions

    Nanoscale thermal diffusion during the laser interference ablation using femto-, pico-, and nanosecond pulses in silicon

    M. Gedvilas, S. Indrišiūnas, B. Voisiat, E. Stankevičius, A. Selskis and G. Račiukaitis, Phys. Chem. Chem. Phys., 2018, 20, 12166
    DOI: 10.1039/C7CP08458G

Search articles by author

Spotlight

Advertisements