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Nanoscale thermal diffusion during the laser interference ablation by femto-, pico-, and nanosecond pulses in silicon

Abstract

The laser interference ablation in silicon using femto-, pico-, and nanosecond pulses was investigated. The experimental and computational results provide information about nanoscale thermal diffusion during the ultra-short laser-matter interaction. The temperature modulation depth was introduced as a parameter for quality assessment of laser interference ablation. Based on the experiments and calculations the new semi-empirical formula which combines the interference period with the laser pulse duration, thermal modulation depth and thermal diffusivity of the material was derived. The equation is in the excellent agreement with the experimental and modelling results of laser interference ablation. The new formula can be used for selecting the proper pulse duration for periodical structuring with required resolution and quality.

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Publication details

The article was received on 18 Dec 2017, accepted on 13 Apr 2018 and first published on 13 Apr 2018


Article type: Paper
DOI: 10.1039/C7CP08458G
Citation: Phys. Chem. Chem. Phys., 2018, Accepted Manuscript
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    Nanoscale thermal diffusion during the laser interference ablation by femto-, pico-, and nanosecond pulses in silicon

    M. Gedvilas, S. Indrisiunas, B. Voisiat, E. Stankevicius, A. Selskis and G. Raciukaitis, Phys. Chem. Chem. Phys., 2018, Accepted Manuscript , DOI: 10.1039/C7CP08458G

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