Jump to main content
Jump to site search


Abnormal separation of the silicon–oxygen bond in the liquid layering transition of silicon dioxide in a nanoslit

Author affiliations

Abstract

We investigated the unusual layering transition (LT) in quasi-2D liquid silicon dioxide (SiO2) confined in a nanoslit. Our results indicate that the slit size and pressure induce the abnormal LT in liquid SiO2, accompanied by a rapid change in the density, diffusion coefficient, pair correlation function and average potential energy. The silicon and oxygen atoms are almost completely separated under the extremely strong confinement effect, which is the characteristic feature of the LT. The negative slope of the LT lines in the phase diagram at different pressures suggests that a confinement-induced LT occurs at high pressure and a pressure-induced LT occurs at low pressure.

Graphical abstract: Abnormal separation of the silicon–oxygen bond in the liquid layering transition of silicon dioxide in a nanoslit

Back to tab navigation

Publication details

The article was received on 07 Oct 2017, accepted on 23 Dec 2017 and first published on 02 Jan 2018


Article type: Paper
DOI: 10.1039/C7CP06843C
Citation: Phys. Chem. Chem. Phys., 2018, Advance Article
  •   Request permissions

    Abnormal separation of the silicon–oxygen bond in the liquid layering transition of silicon dioxide in a nanoslit

    Z. Wang, T. Li, Y. Duan, W. Wu, Z. Zhao, Y. Liu and H. Li, Phys. Chem. Chem. Phys., 2018, Advance Article , DOI: 10.1039/C7CP06843C

Search articles by author

Spotlight

Advertisements