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Issue 7, 2018
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2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization

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Abstract

A 2D laser lithography protocol for controlled grafting of polymer brushes in a single-step is presented. A series of polyacrylates were grafted from silicon substrates via laser-induced copper-mediated radical polymerization. Film thicknesses up to 39 nm were reached within 125 μs of exposure to UV laser light (351 nm). Successful block copolymerization underpinned the controlled nature of the grafting methodology. The resolution of a small structure of grafted PHEA reached 270 μm and was limited by the type of laser used in the study. Further, a checkerboard pattern of PtBA and POEGA was produced and imaged via time-of-flight secondary ion mass spectrometry (ToF-SIMS), and X-ray photoelectron spectroscopy (XPS).

Graphical abstract: 2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization

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Publication details

The article was received on 02 Nov 2017, accepted on 15 Dec 2017 and first published on 18 Dec 2017


Article type: Communication
DOI: 10.1039/C7CC08444G
Citation: Chem. Commun., 2018,54, 751-754
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    2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization

    J. Laun, Y. De Smet, E. Van de Reydt, A. Krivcov, V. Trouillet, A. Welle, H. Möbius, C. Barner-Kowollik and T. Junkers, Chem. Commun., 2018, 54, 751
    DOI: 10.1039/C7CC08444G

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