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N-doping of plasma exfoliated graphene oxide via dielectric barrier discharge plasma treatment for oxygen reduction reaction

Abstract

Nitrogen doped plasma exfoliated graphene oxide (N-PEGO) was demonstrated by fast and effective dielectric barrier discharge (DBD) plasma technology. The plasma treatment could provide a burst open and high-energy electron/ion collision mechanism for doping and exfoliating. The ammonium carbonate was previously inserted into the interlayer of the GO powder, and the rapid release of the NH3 and CO2 gas during DBD plasma treatment could exfoliate the GO powder into few-layer PEGO (< 4 layers). Moreover, the plasma treatment also introduce nitrogen dopant (5.26 at%), which is proven to be an efficient strategy to enhance the performance of oxygen reduction reaction (ORR) electrocatalysts. The resulting N-PEGO showed a high onset potential approach to commercial Pt/C, i.e., 0.89 V vs reversible hydrogen electrode (RHE) and good electrocatalysis stability towards the ORR. This fast and effective one-step doping and exfoliation strategy demonstrated a new industrial-scale N-doped graphene fabrication technique.

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Publication details

The article was received on 29 Sep 2017, accepted on 14 Nov 2017 and first published on 14 Nov 2017


Article type: Paper
DOI: 10.1039/C7TA08607E
Citation: J. Mater. Chem. A, 2017, Accepted Manuscript
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    N-doping of plasma exfoliated graphene oxide via dielectric barrier discharge plasma treatment for oxygen reduction reaction

    Y. Wang, F. Yu, M. Zhu, C. Ma, D. Zhao, C. Wang, A. Zhou, B. Dai, J. Ji and X. Guo, J. Mater. Chem. A, 2017, Accepted Manuscript , DOI: 10.1039/C7TA08607E

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