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Interstitial boron-doped anatase TiO2 thin-films on optical fibres: atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

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Abstract

Temperature sensitive poly(methyl methacrylate) (PMMA) optical fibres were coated with boron doped-anatase crystalline TiO2 thin films in a one-step atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) process. Both the undoped and interstitial boron-doped TiO2 thin films showed photoactivity under UV irradiation, with the boron-doped thin films presenting higher photodegradation rates when compared to the undoped samples.

Graphical abstract: Interstitial boron-doped anatase TiO2 thin-films on optical fibres: atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

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Publication details

The article was received on 06 Mar 2017, accepted on 10 May 2017 and first published on 10 May 2017


Article type: Communication
DOI: 10.1039/C7TA02029E
Citation: J. Mater. Chem. A, 2017, Advance Article
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    Interstitial boron-doped anatase TiO2 thin-films on optical fibres: atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxide coatings on temperature-sensitive substrates

    M. Quesada-González, K. Baba, C. Sotelo-Vázquez, P. Choquet, C. J. Carmalt, I. P. Parkin and N. D. Boscher, J. Mater. Chem. A, 2017, Advance Article , DOI: 10.1039/C7TA02029E

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