Patterning of perovskite–polymer films by wrinkling instabilities

G. Nasti; S. Sanchez; I. Gunkel; S. Balog; B. Roose; B. D. Wilts; J. Teuscher; G. Gentile; P. Cerruti; V. Ambrogi; C. Carfagna; U. Steiner; A. Abate

doi:10.1039/C6SM02629J

Patterning of perovskite–polymer films by wrinkling instabilities†

G. Nasti,

^abc S. Sanchez,^d I. Gunkel,

^d S. Balog,

^d B. Roose,^d B. D. Wilts,

^d J. Teuscher,

^e G. Gentile,

^b P. Cerruti,^b V. Ambrogi,^a C. Carfagna,^b U. Steiner

^d and A. Abate

*^d

Author affiliations

* Corresponding authors

^a Department of Chemical, Materials and Production Engineering, University of Naples “Federico II”, Piazzale Tecchio 80, 80125 Napoli, Italy

^b Institute for Polymers, Composites and Biomaterials (IPCB-CNR), via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy

^c Institute of Applied Sciences and Intelligent System, Via Campi Flegrei 34, Pozzuoli (NA), Italy

^d Adolphe Merkle Institute, University of Fribourg, Chemin des Verdiers 4, CH-1700 Fribourg, Switzerland
E-mail: antonioabate83@gmail.com

^e Group for Photochemical Dynamics, Institute of Chemical Sciences and Engineering, École Polytechnique Fédérale de Lausanne, Station 6, CH-1015 Lausanne, Switzerland

Abstract

Organic–inorganic perovskites are semiconductors used for applications in optoelectronics and photovoltaics. Micron and submicron perovskite patterns have been explored in semitransparent photovoltaic and lasing applications. In this work, we show that a polymeric medium can be used to create a patterned perovskite, by using a novel and inexpensive approach.

Soft Matter

Patterning of perovskite–polymer films by wrinkling instabilities†

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