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Reaction Chemistry & Engineering

Bridging the gap between chemistry and chemical engineering
Free access for 2016 and 2017


A sensitivity analysis of a numbered-up photomicroreactor system

Corresponding authors
Micro Flow Chemistry and Process Technology, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, Den Dolech 2, 5600 MB Eindhoven, The Netherlands
E-mail: t.noel@tue.nl
Tel: +31 40 247 3623
Department of Chemical Engineering, School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, P.R. China
E-mail: y.su@sjtu.edu.cn
React. Chem. Eng., 2017, Advance Article

DOI: 10.1039/C7RE00024C
Received 20 Feb 2017, Accepted 13 Mar 2017
First published online 13 Mar 2017

This article is part of themed collection: Reaction Chemistry & Engineering Emerging Investigators
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