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RAFT synthesis and micellization of a photo-, temperature- and pH-responsive diblock copolymer based on spiropyran

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Abstract

A photo-, temperature- and pH-responsive diblock copolymer comprised of poly(2-spiropyranpropyl methacrylate)-b-poly(N-isopropylacrylamide) (PSPPMA-b-PNIPAM) containing a solvophobic photo- and pH-responsive block of PSPPMA and a thermoresponsive PNIPAM block was synthesized via RAFT polymerization. This successful synthesis of the block copolymer was ascribed to introducing a 8-atom spacer between the C[double bond, length as m-dash]C and rigid spiropyran (SP) moiety to reduce the steric repulsion. The self-assembly of PSPPMA-b-PNIPAM containing a rigid SP moiety resembled a rod-coil diblock copolymer. The size of the PSPPMA-b-PNIPAM nano-assemblies was relatively large and the morphology of the PSPPMA-b-PNIPAM nano-assemblies changed from micelles to vesicles upon increasing the degree of polymerization in the PSPPMA block. The PSPPMA-b-PNIPAM nano-assemblies are photo-, temperature- and pH-responsive, and the micelles-to-vesicles transition took place under 365 nm light irradiation or acidification of the polymer solution. This micelles-to-vesicles transition was ascribed to the light or pH induced spiropyran-to-merocyanine transformation in the PSPPMA block.

Graphical abstract: RAFT synthesis and micellization of a photo-, temperature- and pH-responsive diblock copolymer based on spiropyran

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Publication details

The article was received on 09 Oct 2017, accepted on 02 Nov 2017 and first published on 03 Nov 2017


Article type: Paper
DOI: 10.1039/C7PY01714F
Citation: Polym. Chem., 2017, Advance Article
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    RAFT synthesis and micellization of a photo-, temperature- and pH-responsive diblock copolymer based on spiropyran

    Y. Zhang, M. Cao, B. Yuan, T. Guo and W. Zhang, Polym. Chem., 2017, Advance Article , DOI: 10.1039/C7PY01714F

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