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Polymer Chemistry

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Oxygen tolerant photopolymerization for ultralow volumes

Corresponding authors
Centre for Advanced Macromolecular Design (CAMD), UNSW Australia, Sydney, Australia
Australian Centre for NanoMedicine (ACN), UNSW Australia, Sydney, Australia
E-mail: cboyer@unsw.edu.au
Polym. Chem., 2017, Advance Article

DOI: 10.1039/C7PY00007C
Received 03 Jan 2017, Accepted 31 Jan 2017
First published online 16 Feb 2017

This article is part of themed collection: Pioneering Investigators
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