Jump to main content
Jump to site search


Fabrication of carbon quantum dots with nano-defined position and pattern in one step via sugar-electron-beam writing

Author affiliations

Abstract

Quantum dots (QDs) are promising materials in nanophotonics, biological imaging, and even quantum computing. Precise positioning and patterning of QDs is a prerequisite for realizing their actual applications. Contrary to the traditional two discrete steps of fabricating and positioning QDs, herein, a novel sugar-electron-beam writing (SEW) method is reported for producing QDs via electron-beam lithography (EBL) that uses a carefully chosen synthetic resist, poly(2-(methacrylamido)glucopyranose) (PMAG). Carbon QDs (CQDs) could be fabricated in situ through electron beam exposure, and the nanoscale position and luminescence intensity of the produced CQDs could be precisely controlled without the assistance of any other fluorescent matter. We have demonstrated that upon combining an electron beam with a glycopolymer, in situ production of CQDs occurs at the electron beam spot center with nanoscale precision at any place and with any patterns, an advancement that we believe will stimulate innovations in future applications.

Graphical abstract: Fabrication of carbon quantum dots with nano-defined position and pattern in one step via sugar-electron-beam writing

Back to tab navigation

Supplementary files

Publication details

The article was received on 24 Oct 2017, accepted on 15 Nov 2017 and first published on 16 Nov 2017


Article type: Paper
DOI: 10.1039/C7NR07892G
Citation: Nanoscale, 2017, Advance Article
  •   Request permissions

    Fabrication of carbon quantum dots with nano-defined position and pattern in one step via sugar-electron-beam writing

    Y. Weng, Z. Li, L. Peng, W. Zhang and G. Chen, Nanoscale, 2017, Advance Article , DOI: 10.1039/C7NR07892G

Search articles by author

Spotlight

Advertisements