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Revisit of the Saito-Dresselhaus-Dresselhaus C2 Ingestion Model: on the Mechanism of Atomic-Carbon-Participated Fullerene Growth

Abstract

We introduce a mechanistic study based on a controversial fullerene bottom-up growth model proposed by R. Saito, G. Dresselhaus, and M. S. Dresselhaus. The so-called SDD C2 addition model has been dismissed as chemically inadmissible but here we prove that it is feasible via successive atomic-carbon-participated addition and migration reactions. Kinetic calculations on the formation of isolated pentagon rule (IPR)-obeying C70 and Y3N@C80 are carried out by employing the SDD model for the first time. A stepwise mechanism is proposed with a considerably low barrier of c.a. 2 eV which is about 3 eV lower than a conventional isomerization-containing fullerene growth pathway.

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Publication details

The article was received on 09 Jul 2017, accepted on 27 Sep 2017 and first published on 29 Sep 2017


Article type: Paper
DOI: 10.1039/C7NR04966H
Citation: Nanoscale, 2017, Accepted Manuscript
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    Revisit of the Saito-Dresselhaus-Dresselhaus C2 Ingestion Model: on the Mechanism of Atomic-Carbon-Participated Fullerene Growth

    W. Wang, J. Dang, X. Zhao and S. Nagase, Nanoscale, 2017, Accepted Manuscript , DOI: 10.1039/C7NR04966H

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