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Issue 29, 2017
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Brownmillerite thin films as fast ion conductors for ultimate-performance resistance switching memory

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Abstract

An oxide-based resistance memory is a leading candidate to replace Si-based flash memory as it meets the emerging specifications for future memory devices. The non-uniformity in the key switching parameters and low endurance in conventional resistance memory devices are preventing its practical application. Here, a novel strategy to overcome the aforementioned challenges has been unveiled by tuning the growth direction of epitaxial brownmillerite SrFeO2.5 thin films along the SrTiO3 [111] direction so that the oxygen vacancy channels can connect both the top and bottom electrodes rather directly. The controlled oxygen vacancy channels help reduce the randomness of the conducting filament (CF). The resulting device displayed high endurance over 106 cycles, and a short switching time of ∼10 ns. In addition, the device showed very high uniformity in the key switching parameters for device-to-device and within a device. This work demonstrates a feasible example for improving the nanoscale device performance by controlling the atomic structure of a functional oxide layer.

Graphical abstract: Brownmillerite thin films as fast ion conductors for ultimate-performance resistance switching memory

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Publication details

The article was received on 06 Jun 2017, accepted on 20 Jun 2017 and first published on 28 Jun 2017


Article type: Paper
DOI: 10.1039/C7NR04011C
Citation: Nanoscale, 2017,9, 10502-10510
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    Brownmillerite thin films as fast ion conductors for ultimate-performance resistance switching memory

    S. K. Acharya, J. Jo, N. V. Raveendra, U. Dash, M. Kim, H. Baik, S. Lee, B. H. Park, J. S. Lee, S. C. Chae, C. S. Hwang and C. U. Jung, Nanoscale, 2017, 9, 10502
    DOI: 10.1039/C7NR04011C

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