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Covalent bonding-assisted nanotransfer lithography for the fabrication of plasmonic nano-optical elements

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Abstract

Many high-resolution patterning techniques have been developed to realize nano- and microscale applications of electric devices, sensors, and transistors. However, conventional patterning methods based on photo or e-beam lithography are not employed to fabricate optical elements of high aspect ratio and a sub-100 nm scale due to the limit of resolution, high costs and low throughput. In this study, covalent bonding-assisted nanotransfer lithography (CBNL) was proposed to fabricate various structures of high resolution and high aspect ratio at low cost by a robust and fast chemical reaction. The proposed process is based on the formation of covalent bonds between silicon of adhesive layers on a substrate and oxygen of the deposited material on the polymer stamp. The covalent bond is strong enough to detach multiple layers from the stamp for a large area without defects. The obtained nanostructures can be used for direct application or as a hard mask for etching. Two nano-optical applications were demonstrated in this study, i.e., a meta-surface and a wire-grid polarizer. A perfect absorption meta-surface was generated by transferring subwavelength hole arrays onto a substrate without any post-processing procedures. In addition, a wire-grid polarizer with high aspect ratio (1 : 3) and 50 nm line width was prepared by the nano-transfer of materials, which were used as a hard mask for etching. Therefore, CBNL provides a means of achieving large-area nano-optical elements with a simple roll-to-plate process at low cost.

Graphical abstract: Covalent bonding-assisted nanotransfer lithography for the fabrication of plasmonic nano-optical elements

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Publication details

The article was received on 14 Apr 2017, accepted on 27 Jun 2017 and first published on 29 Jun 2017


Article type: Paper
DOI: 10.1039/C7NR02666H
Citation: Nanoscale, 2017, Advance Article
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    Covalent bonding-assisted nanotransfer lithography for the fabrication of plasmonic nano-optical elements

    S. H. Hwang, S. Jeon, M. J. Kim, D. Choi, J. Choi, J. Jung, K. Kim, J. Lee, J. H. Jeong and J. R. Youn, Nanoscale, 2017, Advance Article , DOI: 10.1039/C7NR02666H

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