Jump to main content
Jump to site search
PLANNED MAINTENANCE Close the message box

Scheduled maintenance upgrade on Thursday 4th of May 2017 from 8.00am to 9.00am (BST).

During this time our websites will be offline temporarily. If you have any questions please use the feedback button on this page. We apologise for any inconvenience this might cause and thank you for your patience.

Sulfur vacancy-induced reversible doping of transition metal disulfides via hydrazine treatment


Chemical doping of transition metal dichalcogenides (TMDCs) has drawn significant interest because of its applicability to the modification of electrical and optical properties of TMDCs. This is of fundamental and technological importance for high-efficiency electronic and optoelectronic devices. Here, we present a simple and facile route to reversible and controllable modulation of the electrical and optical properties of WS2 and MoS2 via hydrazine doping and sulfur annealing. Hydrazine treatment of WS2 improves the field-effect mobilities, on/off current ratios, and photoresponsivities of the devices. This is due to the surface charge transfer doping of WS2 and the sulfur vacancies formed by its reduction, which result in an n-type doping effect. The changes in the electrical and optical properties are fully recovered when the WS2 is annealed in an atmosphere of sulfur. This method for reversible modulation can be applied to other transition metal disulfides including MoS2, which may enable the fabrication of two-dimensional electronic and optoelectronic devices with tunable properties and improved performance.

Back to tab navigation
Please wait while Download options loads

Supplementary files

Publication details

The article was received on 16 Mar 2017, accepted on 18 Apr 2017 and first published on 20 Apr 2017

Article type: Paper
DOI: 10.1039/C7NR01883E
Citation: Nanoscale, 2017, Accepted Manuscript
  •   Request permissions

    Sulfur vacancy-induced reversible doping of transition metal disulfides via hydrazine treatment

    S. Chee, C. Oh, M. Son, G. Son, H. Jang, T. J. Yoo, S. Lee, W. Lee, J. Y. Hwang, H. Choi, B. H. Lee and M. Ham, Nanoscale, 2017, Accepted Manuscript , DOI: 10.1039/C7NR01883E

Search articles by author