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Issue 44, 2017
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Athermal repair of nanoscale defects in optical materials using a femtosecond laser

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Abstract

Ion implantation is widely used to fabricate advanced optical and optoelectronic materials and devices. However, nanoscale defects generated during the ion implantation process severely affect the quality and properties of the material and device. Here, combining computational simulations and experiments, we investigate the mechanism for defect repair in fused silica after Cu ion implantation using femtosecond laser irradiation with an energy fluence much lower than the ablation threshold. Atomic force microscopy demonstrates no unexpected ablation. The optical absorption spectra show that various types of defects with formation energies between 1.9 and 6.2 eV can be repaired successfully via an athermal procedure. The Raman spectra imply that the broken chemical bonds reconnect after femtosecond laser irradiation. Our study reveals that low-energy femtosecond laser irradiation can transfer the appropriate energy needed to repair defects; thus it could be useful in fabricating nonlinear optical devices due to its high spatial selectivity and convenience.

Graphical abstract: Athermal repair of nanoscale defects in optical materials using a femtosecond laser

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Publication details

The article was received on 05 Mar 2017, accepted on 22 Jun 2017 and first published on 23 Jun 2017


Article type: Paper
DOI: 10.1039/C7NR01599B
Citation: Nanoscale, 2017,9, 17233-17240
  • Open access: Creative Commons BY license
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    Athermal repair of nanoscale defects in optical materials using a femtosecond laser

    Q. Cao, J. Zhang, J. Du, H. Zhao, S. Liu and Q. Peng, Nanoscale, 2017, 9, 17233
    DOI: 10.1039/C7NR01599B

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