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Nanostructure Nitride Light Emitting Diodes via Talbot Effect using Improved Colloidal Photolithography

Abstract

We report a new approach of Talbot effect based colloidal photolithography for fabricating nanostructure light emitting diodes (LEDs) here. By employing a rigid nanohole metal array template (RDT) as the diffraction grating and a polysiloxane-based spin on dielectric (SOD) as the thickness-controllable spacer layer, various InGaN/GaN nanostructure LEDs have been fabricated. Three-dimensional finite-difference time-domain (3D-FDTD) simulations have been conducted to verify the proposed approach. Photoluminescence (PL) and time-resolved photoluminescence (TRPL) have been carried out to investigate the optical properties of the obtained nanostructure LEDs. Our report shows significance in two dimensional (2D) functional nanostructures fabrication and understanding the optical properties of various nanostructure InGaN/GaN LEDs.

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Publication details

The article was received on 09 Mar 2017, accepted on 05 May 2017 and first published on 05 May 2017


Article type: Communication
DOI: 10.1039/C7NR01586K
Citation: Nanoscale, 2017, Accepted Manuscript
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    Nanostructure Nitride Light Emitting Diodes via Talbot Effect using Improved Colloidal Photolithography

    L. Wang, Z. Liu, Z. Li, Y. Zhang, H. Li, X. Yi, J. Wang, J. li and G. Wang, Nanoscale, 2017, Accepted Manuscript , DOI: 10.1039/C7NR01586K

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