Jump to main content
Jump to site search


An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography

Author affiliations

Abstract

The fabrication of large-area and well-ordered nanostructures using lithographic techniques is challenging. We have developed novel approaches for sub-50 nm nanopatterning using an electrohydrodynamic lithography (EHL) technique by tailoring experimental parameters such as applied voltage, stamp features, filling ratio, and choice of resist film. We obtain a sub-50 nm pattern replica from a master stamp that contains an array of line patterns having 50 nm widths. Moreover, we show that a far-smaller pattern replication than the original pattern size can be readily obtained by carefully adjusting the experimental conditions. Perfect- and much smaller-pattern replicas have been realized from the master stamp with an array of hole patterns having a 400 nm hole size by tuning the filling ratio. We also demonstrate that an array of 30 nm graphene nanoribbons can be easily fabricated by exploring a hierarchical core–shell template structure employing a bilayer resist film via an EHL technique. The proposed minimal-contact patterning method is simple, versatile, and inexpensive and has potential to become a powerful technique for realizing feasible ultrafine nanostructures on a wafer scale.

Graphical abstract: An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography

Back to tab navigation

Supplementary files

Publication details

The article was received on 01 Feb 2017, accepted on 29 May 2017 and first published on 31 May 2017


Article type: Paper
DOI: 10.1039/C7NR00749C
Citation: Nanoscale, 2017, Advance Article
  •   Request permissions

    An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography

    S. Lee, S. Jung, A. Jang, J. Hwang, H. S. Shin, J. Lee and D. J. Kang, Nanoscale, 2017, Advance Article , DOI: 10.1039/C7NR00749C

Search articles by author

Spotlight

Advertisements