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Nanolithography of cylinder forming DSA for semiconductor manufacturing

Abstract

To realize the full benefit of directed self assembly (DSA), it is necessary to understand the interplay between target structures and the process parameters. In this paper we cover the reasons as to why a compact model and model-based synthesis is required for cylinder forming Graphoepitaxial DSA.

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Publication details

The article was received on 28 Jul 2017, accepted on 07 Nov 2017 and first published on 07 Nov 2017


Article type: Paper
DOI: 10.1039/C7ME00066A
Citation: Mol. Syst. Des. Eng., 2017, Accepted Manuscript
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    Nanolithography of cylinder forming DSA for semiconductor manufacturing

    J. A. Torres and Y. Granik, Mol. Syst. Des. Eng., 2017, Accepted Manuscript , DOI: 10.1039/C7ME00066A

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