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Nanolithography of cylinder forming block copolymers via DSA for semiconductor manufacturing

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Abstract

To realize the full benefit of directed self-assembly (DSA), it is necessary to understand the interplay between the target structures and the process parameters. In this paper, we cover the reasons as to why a compact model and model-based synthesis are required for graphoepitaxial DSA of cylinder forming block copolymers.

Graphical abstract: Nanolithography of cylinder forming block copolymers via DSA for semiconductor manufacturing

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Publication details

The article was received on 28 Jul 2017, accepted on 07 Nov 2017 and first published on 07 Nov 2017


Article type: Paper
DOI: 10.1039/C7ME00066A
Citation: Mol. Syst. Des. Eng., 2017, Advance Article
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    Nanolithography of cylinder forming block copolymers via DSA for semiconductor manufacturing

    Y. Granik and A. Torres, Mol. Syst. Des. Eng., 2017, Advance Article , DOI: 10.1039/C7ME00066A

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