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Issue 5, 2017
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Depth profile analysis with glow discharge spectrometry

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Abstract

Nowadays, glow discharge-optical emission spectrometry (GD-OES) and glow discharge-mass spectrometry (GD-MS) can be considered as two well established techniques for depth profiling, offering practical interest to assist the synthesis optimization process and the quality control of materials coated with thin or thick layers. In this article, actual commercial instrumentation and depth profile quantification methods with these two analytical tools are first briefly reviewed. Afterwards particular attention is paid to the description of recent applications which show the almost unique capabilities of GD-OES and GD-MS for fast elemental quantitative depth profiling of films going from an atomic layer up to more than a hundred micrometres. Moreover, some illustrative applications are shown for the characterization of organic films resorting to GD-OES and GD-MS.

Graphical abstract: Depth profile analysis with glow discharge spectrometry

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Publication details

The article was received on 10 Feb 2017, accepted on 24 Mar 2017 and first published on 29 Mar 2017


Article type: Critical Review
DOI: 10.1039/C7JA00055C
Citation: J. Anal. At. Spectrom., 2017,32, 920-930
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    Depth profile analysis with glow discharge spectrometry

    L. Lobo, B. Fernández and R. Pereiro, J. Anal. At. Spectrom., 2017, 32, 920
    DOI: 10.1039/C7JA00055C

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