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A cobalt(II)heteroarylalkenolate precursor for homogeneous Co3O4 coatings by atomic layer deposition

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Abstract

We present a new and efficient cobalt precursor, CoII(DMOCHCOCF3)2, to prepare Co3O4 thin films and conformal coatings. In the synthesis of this Co complex, heteroaryl moieties and CF3-groups were combined leading to the precursor with high thermal stability and volatility. The suitability of this precursor for ALD deposition was tested on flat silicon substrates and TiO2/C nanofibers upon process optimization. Deposition at 200 °C results in homogeneous and smooth Co3O4 thin films with a growth rate of 0.02 nm per cycle. Conformal coatings have been successfully obtained on TiO2/C nanofibers, making them an attractive platform for surface chemistry studies on high aspect ratio structures for future photocatalysts, sensors, supercapacitors and batteries.

Graphical abstract: A cobalt(ii)heteroarylalkenolate precursor for homogeneous Co3O4 coatings by atomic layer deposition

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Publication details

The article was received on 28 Jul 2017, accepted on 01 Sep 2017 and first published on 01 Sep 2017


Article type: Paper
DOI: 10.1039/C7DT02757E
Citation: Dalton Trans., 2017, Advance Article
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    A cobalt(II)heteroarylalkenolate precursor for homogeneous Co3O4 coatings by atomic layer deposition

    M. Büyükyazi, T. Fischer, P. Yu, M. Coll and S. Mathur, Dalton Trans., 2017, Advance Article , DOI: 10.1039/C7DT02757E

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