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Issue 14, 2017
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Atomic layer deposition of nickel–cobalt spinel thin films

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Abstract

We report the atomic layer deposition (ALD) of high-quality crystalline thin films of the spinel-oxide system (Co1−xNix)3O4. These spinel oxides are ferrimagnetic p-type semiconductors, and promising material candidates for several applications ranging from photovoltaics and spintronics to thermoelectrics. The spinel phase is obtained for Ni contents exceeding the x = 0.33 limit for bulk samples. It is observed that the electrical resistivity decreases continuously with x while the magnetic moment increases up to x = 0.5. This is in contrast to bulk samples where a decrease of resistivity is not observed for x > 0.33 due to the formation of a rock-salt phase. From UV-VIS-NIR absorption measurements, a change from distinct absorption edges for the parent oxide Co3O4 to a continuous absorption band ranging deep into the near infrared for 0 < x ≤ 0.5 was observed. The conformal deposition of dense films on high-aspect-ratio patterns is demonstrated.

Graphical abstract: Atomic layer deposition of nickel–cobalt spinel thin films

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Publication details

The article was received on 10 Feb 2017, accepted on 16 Mar 2017 and first published on 17 Mar 2017


Article type: Paper
DOI: 10.1039/C7DT00512A
Citation: Dalton Trans., 2017,46, 4796-4805
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    Atomic layer deposition of nickel–cobalt spinel thin films

    D. J. Hagen, T. S. Tripathi and M. Karppinen, Dalton Trans., 2017, 46, 4796
    DOI: 10.1039/C7DT00512A

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