Issue 3, 2018

Dissolution induced self-selective Zn- and Ru-doped TiO2 structure for electrochemical generation of KClO3

Abstract

We demonstrate an electrochemical approach to prepare a highly active and stable (Zn, Ru)-doped TiO2 (Ru0.26Ti0.73Zn0.01Ox) for electrochemical generation of KClO3. The essential ingredients of this approach consists of (1) co-electrodeposition of Ru, Ti, and Zn as a metallic alloy and then annealing it to form an oxide, (2) dissolution under electrochemical oxidative acidic environment of Ru and Zn-rich surface clusters having a high selectivity towards oxygen evolution reaction (OER) affording the Ti-enriched structure that is more selective to chlorine evolution reaction (CER), and (3) using this electrocatalyst for KClO3 production under near-neutral pH conditions. The dissolution of Ru- and Zn-enriched surfaces resulted in a porous structure with a higher electrochemical surface area and roughness. Furthermore, this electrochemical dissolution of the (Zn, Ru)-rich surface results in an electrocatalytic structure that is self-selective towards the KClO3 formation with a higher specific activity. The co-electrodeposition of Zn aids (1) the formation of the roughened and porous surface structure through surface dissolution of Zn- or ZnO-clusters and (2) the enhancement of conductivity of the electrocatalyst through the formation of oxygen vacancies. The obtained structure exhibited a higher specific activity and stability towards the KClO3 production in comparison to the untreated (Zn, Ru)-doped TiO2 or Ru-doped TiO2 or RuO2.

Graphical abstract: Dissolution induced self-selective Zn- and Ru-doped TiO2 structure for electrochemical generation of KClO3

Supplementary files

Article information

Article type
Paper
Submitted
07 Sep 2017
Accepted
29 Dec 2017
First published
29 Dec 2017

Catal. Sci. Technol., 2018,8, 878-886

Dissolution induced self-selective Zn- and Ru-doped TiO2 structure for electrochemical generation of KClO3

S. Saha, K. Kishor and R. G. S. Pala, Catal. Sci. Technol., 2018, 8, 878 DOI: 10.1039/C7CY01849E

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