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Pulsed laser-deposited n-Si/NiOx photoanodes for stable and efficient photoelectrochemical water splitting

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Abstract

An electrocatalytic and stable nickel oxide (NiOx) thin layer was successfully deposited on an n-Si (100) substrate by pulsed laser deposition (PLD), acting as a photoanode for efficient photo-oxidation of water under solar illumination. It was revealed that the formed n-Si/NiOx heterojunction with good Schottky contact could improve photogenerated charge separation, and thus n-Si photoanodes deposited with a 105 nm-thick NiOx electrocatalytic layer exhibited a photovoltage of ∼350 mV, leading to greatly improved photoelectrochemical performances for water oxidation. The stability of the photoanode was significantly enhanced with the increasing thickness of NiOx protective layers. This study demonstrates a simple and effective method to enable the use of planar n-Si (100) substrates as efficient and durable photoanodes for practical solar water oxidation.

Graphical abstract: Pulsed laser-deposited n-Si/NiOx photoanodes for stable and efficient photoelectrochemical water splitting

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Publication details

The article was received on 19 Jan 2017, accepted on 14 May 2017 and first published on 15 May 2017


Article type: Paper
DOI: 10.1039/C7CY00114B
Citation: Catal. Sci. Technol., 2017, Advance Article
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    Pulsed laser-deposited n-Si/NiOx photoanodes for stable and efficient photoelectrochemical water splitting

    L. He, W. Zhou, D. Cai, S. S. Mao, K. Sun and S. Shen, Catal. Sci. Technol., 2017, Advance Article , DOI: 10.1039/C7CY00114B

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