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Issue 24, 2017
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Nanostructuring of an alkali halide surface by low temperature plasma exposure

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Abstract

Templating insulating surfaces at the nanoscale is an interesting prospect for applications that involve the adsorption of molecules or nanoparticles where electronic decoupling of the adsorbed species from the substrate is needed. In this study, we present a method to structure alkali halide surfaces at the nanoscale using a combination of low temperature plasma exposure and annealing, and characterize the surfaces by atomic force microscopy. We find that nanostructurating can be controlled by the duration of the exposure, the atomic mass of the plasma gas and the subsequent step-by-step annealing process. In contrast to previous studies with electron or high energy (few keV) ion irradiation, our approach of employing moderate particle energy (10–15 eV Ar+ or He+ ions) results in fine nanostructuring at length scales of nanometers and even single atom vacancies.

Graphical abstract: Nanostructuring of an alkali halide surface by low temperature plasma exposure

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Publication details

The article was received on 20 Apr 2017, accepted on 25 May 2017 and first published on 30 May 2017


Article type: Paper
DOI: 10.1039/C7CP02592K
Citation: Phys. Chem. Chem. Phys., 2017,19, 16251-16256
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    Nanostructuring of an alkali halide surface by low temperature plasma exposure

    A. Hinaut, B. Eren, R. Steiner, S. Freund, R. Jöhr, T. Glatzel, L. Marot, E. Meyer and S. Kawai, Phys. Chem. Chem. Phys., 2017, 19, 16251
    DOI: 10.1039/C7CP02592K

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