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SHI Induced surface re-organization of non-amorphisable nanodimensional Fluoride Thin Films


Surface re-organization in nanodimensional fluoride (LiF and BaF2) thin films is observed under dense electronic excitation produced by swift heavy ion (SHI) irradiation. The irradiation was performed at an angle less than 15º with respect to film surface while keeping the sample at liquid nitrogen temperature. The surface of irradiated samples was characterized by atomic force microscopy (AFM) and scanning electron microscopy (SEM) complemented by energy dispersive X-ray spectroscopy (EDX). Detailed analyses indicate that the surface starts cracking at lower fluence. With increase in the ion fluence, the materials shrinking and surface re-structuring lead to lamellae periodic structures. The average width of the wall decreases, while the separation and the height of the structures increase with fluence. The composition of the lamellae walls and the gap in between were analyzed by EDX. At highest fluence of irradiation, strong signal of substrate and negligible signal of F and Ba are observed between the walls of the lamellae structures, which show that the entire deposited material is removed and the Si substrate is completely exposed to the ion beam. It is also observed that the substrate remains unaffected by SHI irradiation and does not undergo any structural transformation as evident by cross-sectional SEM micrograph. Such surface re-organization is not expected in fluoride thin films due to its non-amorphizable nature even at very high fluence SHI irradiation. The concept of grain rotation under SHI irradiation is used to explain the re-organization phenomena in such non-amorphizable materials.

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Publication details

The article was received on 06 Mar 2017, accepted on 05 Aug 2017 and first published on 08 Aug 2017

Article type: Paper
DOI: 10.1039/C7CP01431G
Citation: Phys. Chem. Chem. Phys., 2017, Accepted Manuscript
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    SHI Induced surface re-organization of non-amorphisable nanodimensional Fluoride Thin Films

    M. Kumar, R. K. Pandey, P. Rajput, S. A. Khan, U. B. B. Singh, D. Avasthi and A. C. Pandey, Phys. Chem. Chem. Phys., 2017, Accepted Manuscript , DOI: 10.1039/C7CP01431G

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