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The oxidation kinetics of thin nickel films between 250 and 500 °C

Corresponding authors
Max Planck Institute for Solid State Research, 70569, Stuttgart, Germany
E-mail: r.merkle@fkf.mpg.de
Phys. Chem. Chem. Phys., 2017, Advance Article

DOI: 10.1039/C7CP00476A
Received 21 Jan 2017, Accepted 28 Feb 2017
First published online 17 Mar 2017
This article is licensed under a Creative Commons Attribution 3.0 Unported Licence.
Open Access
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