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Growth mechanisms of alpha-Boron and beta-Boron in copper melt at ambient pressure and its stabilities

Abstract

Relying on copper melt as a solvent, we successfully synthesize alpha-Boron (α-B) and beta-Boron (β-B) at ambient pressure. Distinct obtained allotropes ascribe to different fabrication processes and growth mechanisms. Coralloid eutectic boron appears the messages of α-B, and primary boron has the typical traits of β-B. Considering experimental conditions and morphologies, constituent supercooling with appropriate temperature gradients is chiefly responsible for the growth of α-B. Meanwhile, a proper eutectic temperature and restricted growth space are provided by copper melt for α-B. With regards to the formation of β-B, cyclic-twinning, screw dislocation-driven and the twin plane re-entrant edge (TPRE) growth mechanisms work together. Boron’s growth models were put forward for vivid elucidation of these mechanisms. Thereafter, the stabilities of α-B and β-B were compared based on their forming conditions and sizes. Synthesis α-B and β-B in copper melt at ambient pressure are of great significant for the practical applications in future.

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Publication details

The article was accepted on 13 Jun 2017 and first published on 13 Jun 2017


Article type: Paper
DOI: 10.1039/C7CE00902J
Citation: CrystEngComm, 2017, Accepted Manuscript
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    Growth mechanisms of alpha-Boron and beta-Boron in copper melt at ambient pressure and its stabilities

    Z. Sun, Y. Wu, X. Han, G. Zhang and X. Liu, CrystEngComm, 2017, Accepted Manuscript , DOI: 10.1039/C7CE00902J

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