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Issue 16, 2017
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Crystal engineering for novel functionalities with oxide thin film epitaxy

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Abstract

Oxides have become recognized as one of the most promising next-generation electronic materials due to the varieties of rich functionalities such as superconductivity, ferromagnetism, ferroelectricity, transparency, etc. In addition to the great diversity of functionalities, oxygen affinity with many other elements provides opportunities for crystal engineering in oxides: the properties can be tuned by modification of the bonding state of oxide ions. Epitaxy has been used as a powerful method to conduct such crystal engineering on oxides in the form of thin films. We give a review of recent advancements related with crystal engineering of oxide thin films via epitaxy techniques that control the microscopic crystallographic environment.

Graphical abstract: Crystal engineering for novel functionalities with oxide thin film epitaxy

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Publication details

The article was received on 16 Feb 2017, accepted on 06 Mar 2017 and first published on 06 Mar 2017


Article type: Highlight
DOI: 10.1039/C7CE00322F
Citation: CrystEngComm, 2017,19, 2144-2162
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    Crystal engineering for novel functionalities with oxide thin film epitaxy

    D. Oka and T. Fukumura, CrystEngComm, 2017, 19, 2144
    DOI: 10.1039/C7CE00322F

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