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Controlled fabrication of osmium nanocrystals by electron, laser and microwave irradiation and characterisation by microfocus X-ray absorption spectroscopy

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Abstract

Osmium nanocrystals can be fabricated by electron (3–50 nm, formed by atom migration), 785–815 nm laser (20–50 nm, in micelle islands), and microwave (ca. 1 nm in arrays, >100 mg scale) irradiation of a polymer-encapsulated OsII carborane; microfocus X-ray absorption studies at the Os LIII-edge show differences between the three preparation methods, suggesting that the electron-beam irradiated materials have a significant support interaction and/or surface oxidation, while the laser and microwave samples are more like metallic osmium.

Graphical abstract: Controlled fabrication of osmium nanocrystals by electron, laser and microwave irradiation and characterisation by microfocus X-ray absorption spectroscopy

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Publication details

The article was received on 12 Sep 2017, accepted on 11 Oct 2017 and first published on 23 Oct 2017


Article type: Communication
DOI: 10.1039/C7CC07133G
Citation: Chem. Commun., 2017, Advance Article
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    Controlled fabrication of osmium nanocrystals by electron, laser and microwave irradiation and characterisation by microfocus X-ray absorption spectroscopy

    A. Pitto-Barry, K. Geraki, M. D. Horbury, V. G. Stavros, J. F. W. Mosselmans, R. I. Walton, P. J. Sadler and N. P. E. Barry, Chem. Commun., 2017, Advance Article , DOI: 10.1039/C7CC07133G

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