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Issue 89, 2017
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Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture

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Abstract

Despite their remarkable properties, metal–organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture.

Graphical abstract: Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture

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Publication details

The article was received on 27 Jul 2017, accepted on 11 Oct 2017 and first published on 11 Oct 2017


Article type: Communication
DOI: 10.1039/C7CC05845D
Citation: Chem. Commun., 2017,53, 12100-12103
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    Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture

    J. Bae, J. Jung, H. Y. Park, C. Cho and J. Park, Chem. Commun., 2017, 53, 12100
    DOI: 10.1039/C7CC05845D

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