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Issue 58, 2017
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Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) for 100 μm-thick submicron patterns with an aspect ratio over 100

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Abstract

This is the first report on the fabrication of defect-free submicron structures with more than 100 μm thickness and an aspect ratio over 100. Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) (PGP) was synthesized via radical polymerization. The mechanical properties of the PGP submicron structure displayed a Young's modulus of 6.09 GPa and a hardness of 0.16 GPa, 4.2 and 8 times, respectively, than those of SU8 nanopatterns. These enhancements enable the utilization of ultrathick 2D-/3D-submicron structures as an ideal platform for microelectromechanical systems, big data storage systems, energy devices, etc.

Graphical abstract: Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) for 100 μm-thick submicron patterns with an aspect ratio over 100

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Publication details

The article was received on 05 May 2017, accepted on 27 Jun 2017 and first published on 27 Jun 2017


Article type: Communication
DOI: 10.1039/C7CC02937C
Citation: Chem. Commun., 2017,53, 8172-8175
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    Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) for 100 μm-thick submicron patterns with an aspect ratio over 100

    K. Kim, S. Yu, S. Kim, T. Kim, S. Kim, S. Kang, S. M. Han and J. Jang, Chem. Commun., 2017, 53, 8172
    DOI: 10.1039/C7CC02937C

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