Issue 23, 2017

Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study

Abstract

Dissociative adsorption of CH3NO2 onto a Si(100)-2 × 1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C–N bond in CH3NO2 and the formation of a Si–CH3 surface species are observed at elevated CH3NO2 pressure (0.5 mbar) and temperature (>573 K).

Graphical abstract: Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study

Supplementary files

Article information

Article type
Communication
Submitted
15 Dec 2016
Accepted
30 Jan 2017
First published
01 Feb 2017

Chem. Commun., 2017,53, 3342-3345

Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study

X. Zhang, C. Wang, W. Ji and S. Ptasinska, Chem. Commun., 2017, 53, 3342 DOI: 10.1039/C6CC09961K

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