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Issue 23, 2016
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Printed photonic elements: nanoimprinting and beyond

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Abstract

In order to manufacture large-scale photonic devices of various dimensions at a low cost, a number of patterning techniques have been developed. Nanoimprint lithography is among the most promising given its unique advantages, such as high resolution, fast processing speed, high throughput, compatibility with diverse materials, and low cost. This review covers various aspects of nanoimprint lithography, including its operational principles, material requirements, and different ways of implementation. Nanoimprint lithography facilitates numerous high-performance and low-cost photonic elements, including optical interconnects, sensors, solar cells, and metamaterials. In addition, other related patterning techniques, together with their utilization for photonic device fabrication and their integration with nanoimprint lithography, are briefly discussed.

Graphical abstract: Printed photonic elements: nanoimprinting and beyond

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Publication details

The article was received on 25 Mar 2016, accepted on 08 Apr 2016 and first published on 18 Apr 2016


Article type: Review Article
DOI: 10.1039/C6TC01237J
Citation: J. Mater. Chem. C, 2016,4, 5133-5153
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    Printed photonic elements: nanoimprinting and beyond

    C. Zhang, H. Subbaraman, Q. Li, Z. Pan, J. G. Ok, T. Ling, C. Chung, X. Zhang, X. Lin, R. T. Chen and L. J. Guo, J. Mater. Chem. C, 2016, 4, 5133
    DOI: 10.1039/C6TC01237J

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